Industrial Metallurgical Microscope XJP-405

XJP-405 industrial microscope is equipped with a large moving range mechanical stage, Epi-illuminator, long working distance bright and dark field Infinite Plan objectives, wide field eyepiece with clear images and good contrast. It is developed and aimed at the semiconductor industry, wafer manufacturing, electronic in formation industry, metallurgical industry, and used as high grade industrial microscope. Bright & Dark field observation, EPI-polarizing and DIC observation can proceed. It is widely used in Factories, Research institution and college and Universities to identify and analyze Wafer,FPD,Circuit substrate,Precision moulds.


    Viewing Head
    Compensation Free Trinocular Head, Inclined 30°(50mm-75mm)
    WF10×/20mm,crosshair with reticule 0.1mm
    Quintuple Nosepiece with DIC Jack
    Long working distance bright and dark field Infinite Plan objectives:
    5 ×/0.1B.D/W.D.29.4mm 10×/0.25B.D/W.D.16mm 20×/0.40B.D/W.D.10.6mm 40
    Double layer mechanical stage
    Stage Size: 350mm×310mm
    Moving Range:250mm×250mm
    Flashboard type filters(green,blue,neutral)
    Coaxial coarse &fine focusing adjustment With rack and pinion mechanism Fine
    focusing scale value 0.002mm
    Light Source
    Epi-illumination:With aperture iris diaphragm and field iris Diaphragm, Halogen
    Bulb 12V/100W, AC85V-230V, Brightness Adjustable
    Polarizing Device
    Analyzer rotatable 360,°Polariaer&Analyzer can be moved in/out of the optical path
    Checking Tool
    0.01mm Micrometer
    Optional Accessory
    Eyepiece: WF15×/17mm、WF20×/12.5mm
    1.3Mega、2.0 Mega、3.0 Mega、5.0 Mega pixels CMOS Digital camera eyepiece
    Long working distance bright and dark field Infinite Plan objectives: 50
    ×/0.55B.D/W.D.5.1mm、 80×/0.75B.D/W.D.4mm、100×/0.80B.D/W.D.3mm
    Two-dimensional measurement software
    Professional metallurgical image analysis software
    Photography attachment and CCD Adapter 0.5×、0.57×、0.75×
    Planish tool
    CCD Camera,colour 1/3″High resolution 520 TV lines

    Characteristicsand Description

    1. Adopt UIS High-resolution, Long working distance, and infinity light path
    correcting system objective imaging technology
    2. Extending the multiplexing technology of objective, compatible infinity
    objective with all the observation methods. including bright & dark field
    observation, polarization and also provide with high clear and sharp image in
    each observation method.
    3. Aspherical surface Kohler illumination, increasing the viewing brightness.
    4. WF10 X(Φ25)super wide field Eyepiece, long working distance
    metallurgical objective with bright and dark field
    5. The Nosepiece can be equipped with detachable DIC differential interference