Metallurgical Microscope XJP-158J

XJP-158J Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry, Used as an advanced Metallurgical microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds. This instrument adopts both reflecting and transmitted illumination, Bright&Dark field, DIC and Polarizing observation can proceed under reflecting illumination, and the Bright field observation is done under transmitted light. High quality and reliable optical system brings much clearer and sharper image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.

    Description

    XJP-158J Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry, Used as an advanced Metallurgical microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds. This instrument adopts both reflecting and transmitted illumination, Bright&Dark field, DIC and Polarizing observation can proceed under reflecting illumination, and the Bright field observation is done under transmitted light. High quality and reliable optical system brings much clearer and sharper image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.

    Specification

    Viewing Head
    Compensation Free Trinocular Head, Inclined 30°(50mm-75mm)
    Eyepiece
    WF10×/25mm
    WF10×/20mm,crosshair with reticule 0.1mm
    Objective
    Long working distance bright&dark field Infinity.Plan Objectives:
    5×/0.1B.D/W.D.29.4mm、10×/0.25B.D/W.D.16mm、
    20×/0.40B.D/W.D.10.6mm、40×/0.60B.D/W.D.5.4mm、
    Nosepiece
    With DIC Jack Quadruple Nosepiece
    Stage
    Double layer mechanical stage
    Stage Size: 189mm×160mm
    Moving Range:80mm×50mm
    Filter
    Flashboard type Filters (green,blue,neutral)
    Condenser
    N.A.1.25 Abbe Condenser with iris diaphragm and filter
    Focusing
    Coaxial coarse &fine focusing adjustment with rack and pinion mechanism.Fine
    focusing scale value 0.002mm
    Light Source
    Transmission Illumination: Halogen Bulb 12V/50W,AC85V-230V, Brightness Adjustable
    Epi-illumination:With aperture iris diaphragm and field iris diaphragm, halogen
    Bulb 12V/50W,AC85V-230V, Brightness Adjustable
    Polarizing Device
    Analyzer 360°rotatable,both Polarizer and Analyzer can be moved out of the light path
    Checking Tool
    0.01mm Micrometer
    Optional Accessory
    Two-dimensional measure software
    Professional metallurgical image analysis software
    Epi-illumination:Halogen Bulb 12V/100W,AC85V-230V, Brightness Adjustable
    Long working distance bright & dark field Infinite Planobjectives:
    50×/0.55B.D/W.D.5.1mm、80×/0.75B.D/W.D.4mm、100×/0.80B.D/W.D.3mm
    micrometer eyepiece
    1.3Mega、2.0 Mega、3.0 Mega,5.0 Mega pixels CMOS Digital camera eyepieces
    Photography attachmentand CCD Adapter 0.5×、0.57×、0.75×
    DIC(10×、20×、40×、100×)
    Planishing tool
    CCD Camera,colour 1/3″High resolution 520 TV lines

    Characteristicsand Description

    1. Adopt UIS High-resolution, long working distance, and infinity light path

    correcting system objective imaging technology

    1. Extending the multiplexing technology of objective, compatible infinity

    objective with all the observation methods, including bright&dark field

    observation, polarization and DIC also provide with high clear and sharp

    image in each observation method.

    1. Aspherical surface Kohler illumination, increasing the viewing brightness.
    2. WF10×(Φ25)Super wide viewing field Eyepiece, long working distance

    metallurgical objective with bright and dark field

    1. The Nosepiece can be equipped with detachable DIC differential interference

    device.

    Inquiry